JPS6325657B2 - - Google Patents
Info
- Publication number
- JPS6325657B2 JPS6325657B2 JP1038485A JP1038485A JPS6325657B2 JP S6325657 B2 JPS6325657 B2 JP S6325657B2 JP 1038485 A JP1038485 A JP 1038485A JP 1038485 A JP1038485 A JP 1038485A JP S6325657 B2 JPS6325657 B2 JP S6325657B2
- Authority
- JP
- Japan
- Prior art keywords
- pellicle
- mask
- jig
- peeling
- pellicle frame
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 claims description 17
- 239000004065 semiconductor Substances 0.000 claims description 4
- 239000000428 dust Substances 0.000 description 6
- 239000012528 membrane Substances 0.000 description 6
- 238000003860 storage Methods 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 230000007547 defect Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60010384A JPS61169848A (ja) | 1985-01-23 | 1985-01-23 | マスク保護用ペリクルの剥離方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60010384A JPS61169848A (ja) | 1985-01-23 | 1985-01-23 | マスク保護用ペリクルの剥離方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61169848A JPS61169848A (ja) | 1986-07-31 |
| JPS6325657B2 true JPS6325657B2 (en]) | 1988-05-26 |
Family
ID=11748626
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60010384A Granted JPS61169848A (ja) | 1985-01-23 | 1985-01-23 | マスク保護用ペリクルの剥離方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61169848A (en]) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0229044U (en]) * | 1988-08-16 | 1990-02-23 | ||
| JP3006694B2 (ja) * | 1991-03-29 | 2000-02-07 | ホーヤ株式会社 | フォトマスク保護体の剥離方法 |
| JP2002131892A (ja) * | 2000-10-27 | 2002-05-09 | Asahi Kasei Electronics Co Ltd | ペリクルの剥離方法及びその装置 |
| JP4637053B2 (ja) * | 2006-05-15 | 2011-02-23 | 信越化学工業株式会社 | ペリクルおよびペリクル剥離装置 |
-
1985
- 1985-01-23 JP JP60010384A patent/JPS61169848A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61169848A (ja) | 1986-07-31 |
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